Shew-Tsu Hsu

Title: Shew-Tsu Hsu: Innovator in Semiconductor Technology

Introduction

Shew-Tsu Hsu is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the area of photoresist materials and plasma etching methods. With a total of two patents to his name, Hsu's work has advanced the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Hsu's latest patents include a method for forming via and contact holes with deep UV photoresist. This innovative method improves aspect ratios by utilizing a deep UV photoresist layer that undergoes a curing process with UV radiation. The curing process stabilizes the structure of the photoresist material, reducing the formation of fluorocarbon polymers that can hinder the etching process. Another notable patent is a method of improving an aspect ratio while avoiding etch stop. This plasma etching method enhances the etching profile by incorporating polymer cross-linking reactions during the etching process.

Career Highlights

Shew-Tsu Hsu is currently employed at Taiwan Semiconductor Manufacturing Company Ltd., a leading firm in the semiconductor industry. His work at this company has allowed him to collaborate with other talented professionals and contribute to groundbreaking advancements in semiconductor technology.

Collaborations

Hsu has worked alongside notable colleagues such as Ching-Tien Ma and Tsung-Chuan Chen. Their collaborative efforts have further propelled innovations in the semiconductor field.

Conclusion

Shew-Tsu Hsu's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His work continues to shape the future of semiconductor manufacturing processes.