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For the Inventor, By the Inventor

Brookline, MA, United States of America

Sheri L Ablaza

This inventor holds 8 USPTO granted patents. Top assignee: Shipley Company LLC. Active years: 1996-2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sheri L Ablaza. Retrieved from https://idiyas.com/inventor/sheri-l-ablaza

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 8

% Patents Active = 100.0

Average Co-Inventor Count = 3.8

ph-index = 4

Forward Citations = 40(Granted Patents)


Location History:

  • Brookline, MA (US) (1996 - 2000)
  • Stow, MA (US) (2004)

Company Filing History:

goldMedal8 out of 522 
 
Shipley Company LLC
 patents

Years Active: 1996-2004

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8 patents (USPTO):Explore Patents
1. 6743563 - Photoresist compositions (2004-06-01),
2. 6107425 - Narrow molecular weight distribution polymers and use of same as resin (2000-08-22),
3. 5827634 - Positive acid catalyzed resists (1998-10-27),
4. 5763536 - Polymer for positive acid catalyzed resists (1998-06-09),
5. 5731386 - Polymer for positive acid catalyzed resists (1998-03-24),
6. 5700624 - Positive acid catalyzed resists having an alkali soluble resin with acid (1997-12-23),
7. 5541263 - Polymer having inert blocking groups (1996-07-30),
8. 5514520 - Radiation sensitive composition comprising polymer having inert blocking (1996-05-07),

Title: **Sheri L Ablaza: Innovator in Photoresist Technologies**

Introduction

Sheri L Ablaza, located in Brookline, MA, is a prominent inventor with a remarkable portfolio of 8 patents. With her innovative contributions to the field of photoresist compositions and resin binders, she has made significant advancements that support the evolving needs of the semiconductor industry.

Latest Patents

Among her latest patents, one focuses on photoresist compositions that contain an added acid component. This innovation has been shown to enhance stability during the storage phase between manufacturing and use. The preferred compositions often incorporate an ester-based solvent, such as ethyl lactate or propylene glycol methyl ether acetate, alongside the acid component.

Another notable patent involves the development of narrow molecular weight distribution polymers, providing new methods to produce aqueous developable resin binders for negative-acting photoresists. These methods include free radical polymerization utilized in the presence of a free radical polymerization control agent, specifically a nitroxide polymerization control agent, which facilitates the integration of monomers that enable aqueous solution development.

Career Highlights

Sheri is currently affiliated with Shipley Company, L.L.C., a leading entity in the field of materials for advanced technology. Her role within the organization has allowed her to further her research and collaboration on innovative projects that address current technological challenges.

Collaborations

Throughout her career, Sheri has worked alongside esteemed colleagues such as Mark D Denison and Roger F Sinta. These collaborations have fostered an environment of creativity and innovation, contributing to the enhancements in the efficacy and performance of photoresist materials.

Conclusion

Sheri L Ablaza exemplifies the spirit of innovation in the field of photoresist technology. Her contributions not only reflect her expertise as an inventor but also serve to influence the future direction of this critical area in semiconductor manufacturing. With her continued dedication and collaborative efforts, Sheri is poised to remain at the forefront of technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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