The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 09, 1998
Filed:
Apr. 26, 1996
Applicant:
Inventors:
James W Thackeray, Braintree, MA (US);
Roger F Sinta, Woburn, MA (US);
Mark D Denison, Cambridge, MA (US);
Sheri L Ablaza, Brookline, MA (US);
Assignee:
Shipley Company, L.L.C., Marlborough, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F / ;
U.S. Cl.
CPC ...
5253288 ; 525385 ; 525386 ; 525390 ; 525397 ;
Abstract
The invention comprises a polymer formulated for an acid hardened resist system. The polymer is one having acid labile blocking groups and inert blocking groups. The photoresist comprises the polymer and a photoacid generator. The inclusion of inert blocking groups on the resin improves shelf life without deleteriously affecting photolithographic properties of the resist.
Thackeray, James. (1998). Polymer for positive acid catalyzed resists (U.S. Patent No. 5763536). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5763536
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile