logo

For the Inventor, By the Inventor

Cambridge, MA, United States of America

Mark D Denison

USPTO Granted Patents = 9

Average Co-Inventor Count = 4.0

ph-index = 5

Forward Citations = 46(Granted Patents)


Company Filing History:

goldMedal9 out of 522 
 
Shipley Company LLC
 patents

Years Active: 1994-2000

Loading Chart...
9 patents (USPTO):Explore Patents
1. 6107425 - Narrow molecular weight distribution polymers and use of same as resin (2000-08-22),
2. 5827634 - Positive acid catalyzed resists (1998-10-27),
3. 5763536 - Polymer for positive acid catalyzed resists (1998-06-09),
4. 5731386 - Polymer for positive acid catalyzed resists (1998-03-24),
5. 5700624 - Positive acid catalyzed resists having an alkali soluble resin with acid (1997-12-23),
6. 5541263 - Polymer having inert blocking groups (1996-07-30),
7. 5514520 - Radiation sensitive composition comprising polymer having inert blocking (1996-05-07),
8. 5368993 - Method of forming relief image having line width less than 0.35 microns (1994-11-29),
9. 5340696 - Photoresist compositions with copolymer binder having phenolic and (1994-08-23),

Title: Mark D. Denison: Innovator in Polymer Chemistry

Introduction

Mark D. Denison is a prominent inventor based in Cambridge, MA (US). He has made significant contributions to the field of polymer chemistry, holding a total of 9 patents. His work focuses on developing innovative materials and methods that enhance the performance of photoresist systems.

Latest Patents

Denison's latest patents include advancements in narrow molecular weight distribution polymers and their applications as resin binders. One notable invention provides new methods for producing aqueous developable resin binders for negative-acting photoresists. This method involves free radical polymerization of various monomers in the presence of a free radical polymerization control agent, particularly a nitroxide polymerization control agent. The invention ensures that at least one of the monomer types contains a moiety that allows for aqueous solution development of the photoresist composition.

Another significant patent involves positive acid catalyzed resists. This invention comprises an acid-hardened resist system that includes a resin binder with acid-labile blocking groups and inert blocking groups, along with a photoacid generator. The inclusion of inert blocking groups enhances the shelf life of the resin without negatively impacting the photolithographic properties of the resist.

Career Highlights

Mark D. Denison is currently associated with Shipley Company, L.L.C., where he continues to innovate in the field of polymer chemistry. His expertise and contributions have positioned him as a key figure in the development of advanced materials for various applications.

Collaborations

Throughout his career, Denison has collaborated with notable professionals in the field, including James W. Thackeray and Roger F. Sinta. These collaborations have further enriched his research and development efforts.

Conclusion

Mark D. Denison's work in polymer chemistry exemplifies innovation and dedication to advancing technology in photoresist systems. His contributions through patents and collaborations continue to impact the industry positively.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…