The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 1994
Filed:
Apr. 15, 1994
Applicant:
Inventors:
James W Thackeray, Braintree, MA (US);
Mark Denison, Cambridge, MA (US);
George W Orsula, Tewksbury, MA (US);
Assignee:
Shipley Company Inc., Marlborough, MA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430325 ; 430326 ; 430909 ;
Abstract
The present invention relates to photoresists particularly suitable for deep U.V. exposure and having the capability of forming highly resolved features. The invention is characterized by use of a resist resin binder that comprises a nonaromatic cyclic alcohol-phenol copolymer that has a relatively low molecular weight and narrow distribution of molecular weight and cyclic alcohol concentration.
Thackeray, James. (1994). Method of forming relief image having line width less than 0.35 microns (U.S. Patent No. 5368993). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5368993
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile