Shengsi Liu

Title: Innovations of Shengsi Liu

Introduction

Shengsi Liu is a notable inventor based in Portland, OR (US). He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approaches.

Latest Patents

One of his latest patents is focused on gate cut structures. This patent provides techniques to form semiconductor devices that feature gate cut structures. These structures allow adjacent semiconductor devices, which may include fins or nanoribbons, to have a gate structure extending over them while being separated by a gate cut structure. This innovation enhances the functionality and efficiency of semiconductor devices.

Another significant patent by Liu involves extreme ultraviolet lithography patterning with assist features. This patent discloses techniques for improving extreme ultraviolet (EUV) patterning by utilizing assist features. The assist features increase the coverage of absorber material in the EUV mask, which helps reduce bright field defects during the patterning process. This advancement is crucial for the development of high-performance transistor devices.

Career Highlights

Shengsi Liu is currently employed at Intel Corporation, a leading company in semiconductor manufacturing. His work at Intel has allowed him to contribute to cutting-edge technologies that drive the industry forward.

Collaborations

Throughout his career, Liu has collaborated with notable colleagues, including Leonard P. Guler and Tahir Ghani. These collaborations have fostered an environment of innovation and have led to the development of advanced semiconductor technologies.

Conclusion

Shengsi Liu's contributions to semiconductor technology through his patents and work at Intel Corporation highlight his role as an influential inventor in the field. His innovative techniques continue to shape the future of semiconductor devices.