Company Filing History:
Years Active: 2017
Title: Innovations of Sheng-Min Chuang
Introduction
Sheng-Min Chuang is a prominent inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in photoresist compositions and lithography methods. With a total of 2 patents, his work has been instrumental in advancing integrated circuit manufacturing processes.
Latest Patents
Chuang's latest patents include a photoresist composition designed to reduce photoresist pattern collapse. This innovative composition consists of a first polymer, a second polymer, and a solvent. The first polymer is more soluble than the second in an aqueous solution and exhibits higher etching resistance. Additionally, he has developed a method and tool for lithography, which involves forming a photoresist layer on a substrate, exposing it, rinsing, treating with a chemical modifier, baking, and developing the modified layer.
Career Highlights
Chuang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to push the boundaries of semiconductor technology. His expertise in photoresist materials and lithography techniques has made him a valuable asset to the company.
Collaborations
Some of his notable coworkers include Tsung-Pao Chen and Teng-Kuei Chuang, who collaborate with him on various projects within the semiconductor industry.
Conclusion
Sheng-Min Chuang's contributions to the field of semiconductor technology through his innovative patents and work at Taiwan Semiconductor Manufacturing Company Limited highlight his importance as an inventor. His advancements in photoresist compositions and lithography methods are paving the way for future developments in integrated circuit manufacturing.