Sheng Chen Chung

Title: Innovations by Sheng Chen Chung in Semiconductor Manufacturing

Introduction

Sheng Chen Chung is a notable inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, holding 2 patents that showcase his innovative approaches.

Latest Patents

One of his latest patents is a method for removing hard masks on gates in the semiconductor manufacturing process. This method involves forming a first gate and a second gate with hard masks on a semiconductor substrate, where the second gate is larger than the first. The gates are associated with silicon-germanium (SiGe) source and drain regions to form p-type transistors. A photoresist layer is then deposited, and an opening is created on the hard mask of the second gate. The photoresist layer on both gates is completely removed by etching back, ensuring that there is no residue left. This allows for the complete removal of the hard masks on both gates.

Career Highlights

Sheng Chen Chung works at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has been instrumental in advancing manufacturing techniques that enhance the efficiency and effectiveness of semiconductor production.

Collaborations

He collaborates with talented coworkers, including Hung Chih Tsai and Chih Chieh Chen, who contribute to the innovative environment at their workplace.

Conclusion

Sheng Chen Chung's contributions to semiconductor manufacturing through his patents reflect his expertise and commitment to innovation in the field. His work continues to influence advancements in technology and manufacturing processes.