Beijing, China

Shen Dang

This inventor holds 1 USPTO granted patent. Top assignees: Beijing Sinoma Synthetic Crystals Co., Ltd., Sinoma Synthetic Crystals Co., Ltd.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shen Dang. Retrieved from https://idiyas.com/inventor/shen-dang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Shen Dang: Innovator in Long-Wave Infrared Technology

Introduction

Shen Dang is a notable inventor based in Beijing, China. He has made significant contributions to the field of infrared technology, particularly with his innovative patent related to anti-reflection protective films.

Latest Patents

Shen Dang holds a patent for a long-wave infrared anti-reflection protective film on a ZnS substrate. This invention provides a protective film that comprises a ZnS film layer and a YOfilm layer, which are sequentially arranged on the ZnS substrate. The ZnS substrate has a thickness of 2-15 mm, while the ZnS film layer has a thickness of 80-120 nm, and the YOfilm layer has a thickness of 1000-1300 nm. The preparation method involves polishing and surface treatment of the ZnS substrate, followed by the deposition of the ZnS and YOfilm layers.

Career Highlights

Shen Dang has worked with prominent companies in the field, including Sinoma Synthetic Crystals Co., Ltd. and Beijing Sinoma Synthetic Crystals Co., Ltd. His experience in these organizations has contributed to his expertise in synthetic crystals and infrared technology.

Collaborations

Shen has collaborated with notable coworkers such as Xu Zhang and Xun Qian. Their combined efforts have further advanced the research and development in the field of infrared technology.

Conclusion

Shen Dang's innovative work in long-wave infrared technology showcases his expertise and dedication to advancing the field. His contributions through patents and collaborations highlight the importance of innovation in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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