This inventor holds 2 USPTO granted patents. Top assignees: Kla Tencor Corporation, Kla-Tencor Technologies Corporation. Active years: 2008-2010.
Location History:
- Palo Alto, CA (US) (2008)
- Cupertino, CA (US) (2010)
Company Filing History:
1 out of 1,787 
1 out of 641 
Years Active: 2008-2010
Title: Shem-Tov Levi: Innovator in Lithography Technologies
Introduction
Shem-Tov Levi is a notable inventor based in Cupertino, CA (US). He has made significant contributions to the field of lithography, particularly in data encoding, compression, and transmission technologies. With a total of 2 patents to his name, Levi's work has advanced the capabilities of charged-particle beam direct write lithography.
Latest Patents
Levi's latest patents include a method of data encoding, compression, and transmission enabling maskless lithography. This innovative method involves condensing an initial design file into a set of profiles and a pattern of relative locations to create a formatted pattern file. The formatted pattern file is then adjusted for desired pattern corrections, allowing for the extraction of portions to form data strips. These data strips contain multiple channels with profiles and spatial indicators, which are sequentially read to construct a printable pattern on a substrate.
Another significant patent focuses on systems, control subsystems, and methods for projecting an electron beam onto a specimen. This system is designed to move the specimen at a non-uniform velocity while projecting the electron beam. The control subsystem can alter the characteristics of the electron beam based on the specimen's movement, enhancing the precision of the projection.
Career Highlights
Throughout his career, Shem-Tov Levi has worked with prominent companies in the technology sector, including KLA-Tencor Corporation and KLA-Tencor Technologies Corporation. His experience in these organizations has contributed to his expertise in lithography and electron beam technologies.
Collaborations
Levi has collaborated with notable professionals in his field, including Harald F. Hess and Marian Mankos. These collaborations have further enriched his work and innovations in lithography.
Conclusion
Shem-Tov Levi's contributions to the field of lithography through his patents and career highlights demonstrate his significant impact on technology. His innovative methods and systems continue to influence advancements in data encoding and electron beam projection.