Shao Hua Wang

Title: The Innovative Contributions of Shao Hua Wang

Introduction

Shao Hua Wang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of methods for enhancing the performance of MOS transistor devices. His innovative approach has led to the creation of a unique patent that addresses critical challenges in dopant implantation.

Latest Patents

Shao Hua Wang holds a patent titled "Dopant implantation method using multi-step implants." This patent describes a method of forming a dopant implant region in a MOS transistor device. The method involves implanting a first concentration of dopants into a substrate region, which is less than the target dopant concentration. Without annealing the substrate after the initial implanting step, the method performs at least one second implanting step to implant a second concentration of dopants, ultimately achieving the target dopant concentration.

Career Highlights

Shao Hua Wang is currently employed at Taiwan Semiconductor Manufacturing Company Ltd. His work at this leading semiconductor manufacturer has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in the industry. His expertise in dopant implantation methods has positioned him as a valuable asset in the field of semiconductor research and development.

Collaborations

Shao Hua Wang has collaborated with notable colleagues, including Tse-En Chang and Chih-Fu Chang. These collaborations have fostered an environment of innovation and have led to further advancements in semiconductor technology.

Conclusion

Shao Hua Wang's contributions to the field of semiconductor technology through his innovative patent and collaborative efforts highlight his importance as an inventor. His work continues to influence the development of advanced semiconductor devices, showcasing the impact of his research on the industry.