Shang-Ying Wu

Title: The Innovative Mind of Shang-Ying Wu

Introduction

Shang-Ying Wu, a prominent inventor based in Hsinchu County, Taiwan, has made significant contributions to the field of lithography. With a remarkable portfolio of 11 patents, his work focuses on cutting-edge technologies that enhance semiconductor manufacturing processes.

Latest Patents

Among his latest innovations are two groundbreaking patents related to extreme ultraviolet (EUV) light sources. The first patent, titled "EUV Light Source and Apparatus for Lithography," describes a sophisticated EUV radiation source apparatus. This apparatus includes a collector, a target droplet generator that produces tin (Sn) droplets, and a rotatable debris collection device designed to minimize contamination. This design incorporates a catalytic layer on the vanes of the debris collection device, which helps convert SnH to Sn, improving efficiency.

The second patent, "Radiation Source for Lithography Process," outlines a method for advanced lithography exposure. This method involves irradiating a target droplet with a laser beam to generate EUV light, which is then reflected by a collector. Additionally, a cleaning gas is discharged over the collector, providing a continuous cleaning action that enhances the overall reliability of the lithography process.

Career Highlights

Shang-Ying Wu is currently associated with Taiwan Semiconductor Manufacturing Company Limited (TSMC), a leading semiconductor manufacturer where he applies his expertise to push the boundaries of lithography technology. His innovative work has positioned him as a key contributor to the advancements in semiconductor fabrication, critical for producing smaller and more powerful electronic devices.

Collaborations

Throughout his career, Wu has collaborated with notable colleagues, including Shang-Chieh Chien and Li-Jui Chen. These partnerships have fostered an environment of creativity and innovation, allowing them to tackle complex challenges in the semiconductor industry and drive significant technological advancements.

Conclusion

Shang-Ying Wu stands out as an influential inventor whose patents reflect a deep understanding of lithography and semiconductor manufacturing. His dedication to innovation and collaboration underscores the importance of teamwork in achieving groundbreaking technological advancements. Wu's work continues to shape the future of the semiconductor industry, showcasing the vital role of inventors in driving progress through innovation.