Shang-Rong Li

Title: Innovations of Shang-Rong Li in Semiconductor Technology

Introduction

Shang-Rong Li is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work focuses on enhancing the performance and efficiency of semiconductor devices.

Latest Patents

One of his latest patents is titled "Semiconductor devices with threshold voltage modulation layer." This invention involves a method that includes forming a first fin with alternating first channel layers and first sacrificial layers, as well as a second fin with similar structures. The process also includes forming a capping layer over both fins, creating a dummy gate stack, and forming source/drain features. The method culminates in the formation of a metal gate stack in the gate trench and gaps created during the process.

Another notable patent is "Multi-gate field-effect transistors and methods of forming the same." This patent describes a method for creating a semiconductor structure that involves forming a fin structure with alternating semiconductor layers, cladding layers, and a dummy gate stack. The process includes the removal of the dummy gate stack to create a gate trench and the subsequent formation of a metal gate stack in various openings.

Career Highlights

Shang-Rong Li is currently employed at Taiwan Semiconductor Manufacturing Company Ltd. His work at this leading semiconductor manufacturer has allowed him to innovate and develop advanced technologies that are crucial for modern electronics.

Collaborations

Throughout his career, Shang-Rong Li has collaborated with notable colleagues, including Shih-Hao Lin and Chih-Chuan Yang. These collaborations have contributed to the advancement of semiconductor technologies and have fostered a productive research environment.

Conclusion

Shang-Rong Li's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the field. His innovative methods continue to shape the future of semiconductor devices.