Location History:
- Dallas, TX (US) (1990 - 2003)
- Austin, TX (US) (2010)
Company Filing History:
Years Active: 1990-2010
Title: Innovations of Shane R Palmer
Introduction
Shane R Palmer is a notable inventor based in Dallas, TX, who has made significant contributions to the field of integrated circuit design. With a total of 10 patents to his name, Palmer has demonstrated a commitment to advancing technology through innovative solutions.
Latest Patents
Among his latest patents is the invention titled "Automated circuit design dimension change responsive to low contrast condition determination in photomask phase pattern." This patent focuses on methods for forming a phase pattern for integrated circuit features, ensuring that low contrast conditions are avoided during the design process. Another significant patent is related to "Optical proximity correction," which enhances the optical proximity correction process used in photolithography. This improvement involves mask pattern modeling, optimizing patterns for both reticle manufacture and wafer fabrication.
Career Highlights
Shane R Palmer is currently employed at Texas Instruments Corporation, where he continues to innovate and contribute to the field of electronics. His work has been instrumental in developing technologies that improve the efficiency and effectiveness of integrated circuit manufacturing.
Collaborations
Palmer has collaborated with esteemed colleagues such as Thomas J Aton and Tsen-Hwang Lin, further enriching his work and expanding the impact of his inventions.
Conclusion
Shane R Palmer's contributions to integrated circuit design and photolithography exemplify the spirit of innovation. His patents reflect a deep understanding of the challenges in the field and a dedication to finding effective solutions.