The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 22, 2003
Filed:
Dec. 14, 2000
Shane R. Palmer, Dallas, TX (US);
John N. Randall, Richardson, TX (US);
Thomas J. Aton, Dallas, TX (US);
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
A method of performing and verifying an integrated circuit layout is provided that comprises the steps of performing the layout of a mask. Proximity correction techniques are then applied to the mask layout data. Theoretical contours which comprise curvilinear forms are then extrapolated from the corrected mask data set. The curvilinear contour data is then bounded using boxing algorithms in order to generate a bounded contour data set. The bounded contour data set can then be compared to the original input mask data to detect design rule violations and other characteristics of the original layout.