Shan Jiang

Title: The Innovative Contributions of Shan Jiang

Introduction

Shan Jiang is a prominent inventor based in San Jose, California, known for his significant contributions to the field of semiconductor technology. With a total of 11 patents to his name, he has made remarkable advancements in methods of etching metal-containing layers, particularly tungsten.

Latest Patents

One of Shan Jiang's latest patents focuses on a method of removing a metal-containing layer, such as tungsten, from a substrate. This innovative method involves generating a first plasma in a process volume of a plasma chamber while a patterned device is positioned on a substrate support. The patterned device consists of both a patterned region and an unpatterned region, along with a tungsten-containing layer formed over the substrate. The method includes depositing a first film over the patterned region of the tungsten-containing layer using the first plasma and effectively removing portions of the unpatterned region without depositing the first film over it.

Career Highlights

Throughout his career, Shan Jiang has worked with notable companies, including Applied Materials, Inc. and SAP SE. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies in the semiconductor industry.

Collaborations

Shan Jiang has collaborated with esteemed colleagues such as Akhil Mehrotra and Gene S. Lee. These partnerships have further enhanced his innovative capabilities and have led to the development of advanced technologies in his field.

Conclusion

Shan Jiang's work exemplifies the spirit of innovation in the semiconductor industry. His patents and collaborations reflect his commitment to advancing technology and improving processes in etching metal-containing layers.