Applied Materials, Inc.

Sap Se

Sap Ag

Shan Jiang

Gene S Lee

Akhil Mehrotra

Zohreh Hesabi

Abhijit Patil

Hailong Zhou

Chi-I Lang

Hartmut K Vogler

Matthias Kaiser

Nancy Fung

Jonathan Sungehul Kim

Larry Gao

Jacob A Klein

A method of removing a metal-containing layer (e.g., tungsten) from a substrate is provided. The method includes generating a first plasma in a process volume of a plasma chamber when a patterned device is disposed on a substrate support in the process volume. The patterned device includes a patterned region and an unpatterned region; a substrate; a tungsten-containing layer formed over the substrate; a supporting layer disposed between the tungsten-containing layer and the substrate. The patterned region includes exposed surfaces of the supporting layer and the unpatterned region does not include any exposed surfaces of the supporting layer. The method further includes depositing a first film over the patterned region of the tungsten-containing layer with the first plasma; and removing portions of the unpatterned region of the tungsten-containing layer with the first plasma without depositing the first film over the unpatterned region.

Methods of etching metal-containing layers

Methods for etching a hardmask layer to transfer features into a material layer using an etch process are provided. The methods described herein advantageously facilitate profile and dimension control of features through a proper sidewall and bottom management scheme during the hardmask open process. In one embodiment, a method for etching a hardmask layer to form features in the hardmask layer includes supplying an etching gas mixture onto a substrate to etch an exposed portion of a hardmask layer exposed by a patterned photoresist layer disposed on the substrate, switching the etching gas mixture to a deposition gas mixture comprising a silicon containing gas to form a passivation layer on sidewalls of the hardmask layer and forming openings in the hardmask layer.

Methods for etching a hardmask layer

A method of etching a hardmask layer formed on a substrate is provided. The method includes supplying an etching gas mixture to a processing region of a processing chamber. A device is disposed in the processing region when the etching gas mixture is supplied to the processing region. The device comprises a substrate and a hardmask layer formed over the substrate. The etching gas mixture comprises a fluorine-containing gas, a silicon-containing gas, and an oxygen-containing gas. The method further includes providing RF power to the etching gas mixture to form a plasma in the processing region. The plasma is configured to etch exposed portions of the hardmask layer.

Method of etching hardmasks containing high hardness materials

Methods for etching a bottom anti-reflective coating (BARC) and/or an anti-reflective coating (ARC) and/or a dielectric anti-reflective coating (DARC) to form high aspect ratio features using an etch process are provided. The methods described herein advantageously facilitate profile and dimension control of features with high aspect ratios through a proper sidewall and bottom management scheme during the bottom anti-reflective coating (BARC) and/or an anti-reflective coating (ARC) and/or a dielectric anti-reflective coating (DARC) open process. In one embodiment, a method for etching a dielectric anti-reflective coating (DARC) layer to form features in the DARC layer includes supplying an etching gas mixture onto a DARC layer disposed on a substrate, wherein the substrate is disposed on a substrate support pedestal assembly disposed in a processing chamber, controlling a temperature of the substrate support pedestal assembly greater than 110 degrees Celsius, and etching the DARC layer disposed on the substrate.

Methods for high temperature etching a material layer using protection coating

Methods and apparatus, including computer program products, are provided for in-memory simulations. The method may include forming a virtual cube including at least one change value representative of a change to a simulation; forming another cube including online data; and combining the virtual cube and the other cube to form a union cube representative of a result of the simulation, the virtual cube, other cube, and the union cube comprised in an in-memory storage and shared for at least a session associated with the simulation. Related systems, methods, and articles of manufacture are also disclosed.

In-memory simulations using multidimensional cubes

Techniques are described for allowing a user to define hierarchical relationships for a multidimensional data model without assistance from a data administrator. The hierarchical relationships can be stored as on the client device as part of report metadata so that they are customizable by the client. A graphical user interface is also described for generating reports using a reporting tool. Through move and select operations, a report along with its underlying hierarchical relationships can be customized by the client.

Simplified hierarchy definition for multidimensional data analysis

Techniques are described for creating a context-aware landing page. A context-aware landing page is capable of dynamically updating its tiles to include content tiles which are related to a received triggering event. The triggering event can be received from a business context source. When the triggering event is received, a weighting table that contains a plurality of content tiles can be retrieved. The method can then select one or more content tiles to include in the context-aware landing page. The selection of the one or more content tiles can depend on the triggering event.

Context-aware landing page

Methods and systems are provided for processing natural language queries. Such methods and systems may receive a natural language query from a user and generate corresponding semantic tokens. Information may be retrieved from a knowledge base using the semantic tokens. Methods and systems may leverage an interpretation module to process and analyze the retrieved information in order to determine an intention associated with the natural language query. Methods and systems may leverage an actuation module to provide results to the user, which may be based on the determined intention.

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San Jose, CA, United States of America

Shan Jiang