Bengaluru, India

Shainish Nellikka

USPTO Granted Patents = 2 

Average Co-Inventor Count = 11.0

ph-index = 1


Company Filing History:


Years Active: 2025

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2 patents (USPTO):Explore Patents

Title: Shainish Nellikka: Innovator in Epitaxial Deposition Technology

Introduction

Shainish Nellikka is a notable inventor based in Bengaluru, India. He has made significant contributions to the field of semiconductor manufacturing through his innovative designs and processes. His work focuses on enhancing the efficiency and effectiveness of deposition technologies.

Latest Patents

Shainish Nellikka holds a patent for an "Epitaxial deposition chamber." This invention features a process chamber that includes a chamber body with a ceiling positioned above a floor, along with a chassis and an injector ring situated between them. The design incorporates upper and lower clamp rings that secure the upper and lower sections in place. Additionally, an upper heating module is coupled to the upper clamp ring above the ceiling, while a lower heating module is connected to the lower clamp ring below the floor. This innovative design aims to improve the performance of epitaxial deposition processes.

Career Highlights

Shainish Nellikka is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His role involves developing advanced technologies that contribute to the production of high-quality semiconductor devices. His expertise in epitaxial deposition has positioned him as a valuable asset to his team and the industry.

Collaborations

Shainish has collaborated with several talented individuals in his field, including Shu-Kwan Danny Lau and Brian Hayes Burrows. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Shainish Nellikka's contributions to epitaxial deposition technology highlight his role as an influential inventor in the semiconductor industry. His innovative patent and collaborative efforts demonstrate his commitment to advancing technology in this critical field.

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