This inventor holds 1 USPTO granted patent. Top assignees: Semiconductor Manufacturing International (Beijing) Corporation, Semiconductor Manufacturing International (Shanghai) Corporation. Active years: 2024.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2024
Title: The Innovations of Inventor Sha Sha
Introduction
Sha Sha is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique method for detecting overlay precision.
Latest Patents
Sha Sha holds a patent titled "Method for detecting overlay precision and method for compensating overlay deviation." This patent describes a method for detecting overlay precision, which includes providing a wafer to be detected that has a photoresist layer exposed and developed. The process involves performing a first detection using optical overlay precision measurement to acquire first overlay precision information. A second detection is then performed with a different wavelength or polarization direction of the light source to obtain second overlay precision information. The overlay precision deviation information is acquired based on the first and second overlay precision information. He has 1 patent to his name.
Career Highlights
Sha Sha has worked with notable companies in the semiconductor industry, including Semiconductor Manufacturing International Corporation in Shanghai and Semiconductor Manufacturing International Corporation in Beijing. His experience in these organizations has allowed him to refine his skills and contribute to advancements in technology.
Collaborations
Some of his coworkers include Song Bai and Qiliang Ma, who have collaborated with him on various projects.
Conclusion
Sha Sha's innovative methods and contributions to semiconductor technology highlight his role as a significant inventor in the industry. His work continues to influence advancements in overlay precision detection.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile