Daejeon, South Korea

Seung Yeon Hwang


 

Average Co-Inventor Count = 4.3

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2016-2023

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3 patents (USPTO):Explore Patents

Title: **Innovations by Seung Yeon Hwang: A Pioneer in Photosensitive Resin Technology**

Introduction

Seung Yeon Hwang is a notable inventor based in Daejeon, South Korea, recognized for his contributions to the field of photosensitive materials. With a total of three patents to his name, Hwang's innovations are particularly significant in enhancing the capabilities of materials used in various technological applications.

Latest Patents

Hwang's latest patents showcase cutting-edge developments in resin technology. One of his patents details a **photosensitive resin composition and cured film**, which includes a polyamide-imide resin structured for improved functionality. This invention encompasses not only the composition but also a method for preparing the film and forming a resist pattern using the photosensitive resin. Another noteworthy patent discusses a **vertical alignment layer comprising cyclic olefin copolymer**. This innovation aims to provide excellent liquid crystal vertical alignment while ensuring compatibility with low-temperature processing, highlighting the versatility of cyclic olefin copolymers in alignment layer applications.

Career Highlights

Seung Yeon Hwang is currently associated with LG Chem, Ltd., a leading company in the chemical industry. His role with the firm has been instrumental in spearheading innovative projects that bridge the gap between cutting-edge research and practical applications in technology.

Collaborations

Hwang has worked alongside distinguished colleagues such as Dai Seung Choi and Min Hyung Lee. Their collaborative efforts have greatly contributed to advancing the understanding and application of polymer technologies in various industries.

Conclusion

Seung Yeon Hwang's innovative work in the realm of photosensitive resin technology positions him as a significant figure in his field. His patents not only demonstrate technical prowess but also reflect his commitment to advancing materials science. As he continues to innovate, the potential applications of his work are bound to impact various technological sectors positively.

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