Lg Chem, Ltd

Seung Yeon Hwang

Dai Seung Choi

Min Hyung Lee

Sung-Ho Chun

Dong Woo Yoo

Hyeong Bin Jang

Eun Seok Park

Jung Ha Park

Dongmin Jeong

A photosensitive resin composition including a polyamide-imide resin having a specific structure, a film comprising a cured product of the photosensitive resin composition, a method for preparing the film and a method for forming a resist pattern using the photosensitive resin composition.

Photosensitive resin composition and cured film

The present invention relates to a vertical alignment layer including a cyclic olefin copolymer, and more specifically, the present invention relates to a vertical alignment layer capable of having alignment even in a low temperature process, and exhibiting excellent liquid crystal vertical alignment by including a cyclic olefin copolymer having a specific substituent.

Vertical alignment layer comprising cyclic olefin copolymer

This invention relates to a composition for a photo-alignment layer which can exhibit superior thermal stability, alignability, and alignment rate, and can also suppress generation of an afterimage and further improve a voltage holding ratio when applied to a liquid crystal cell, and to a photo-alignment layer and a liquid crystal alignment layer using the same. The composition for a photo-alignment layer includes a cyclic olefin-based photo-alignment polymer and a polyamic acid ester-based photo-alignment additive.

Composition for photo-alignment layer and photo-alignment layer

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Daejeon, South Korea

Seung Yeon Hwang