The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 2023
Filed:
Nov. 09, 2018
Applicant:
Lg Chem, Ltd., Seoul, KR;
Inventors:
Seung Yeon Hwang, Daejeon, KR;
Dai Seung Choi, Daejeon, KR;
Min Hyung Lee, Daejeon, KR;
Dongmin Jeong, Daejeon, KR;
Assignee:
LG CHEM, LTD., Seoul, KR;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/037 (2006.01); G03F 7/038 (2006.01); G03F 7/023 (2006.01); G03F 7/38 (2006.01); G03F 7/40 (2006.01); G03F 7/039 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0388 (2013.01); G03F 7/0233 (2013.01); G03F 7/039 (2013.01); G03F 7/0387 (2013.01); G03F 7/162 (2013.01); G03F 7/20 (2013.01); G03F 7/322 (2013.01); G03F 7/38 (2013.01); G03F 7/40 (2013.01);
Abstract
A photosensitive resin composition including a polyamide-imide resin having a specific structure, a film comprising a cured product of the photosensitive resin composition, a method for preparing the film and a method for forming a resist pattern using the photosensitive resin composition.