Seung Hak Park

Title: Seung Hak Park and Semiconductor Lithography Innovation.

Introduction

Seung Hak Park is an inventor based in Suwon-si, South Korea, and works at Samsung Electronics Ltd. His patent work concerns detecting and correcting mark coordinates during semiconductor manufacturing.

Latest Patents

Park is associated with 1 patent: “Method for Detecting Coordinate of Mark, Computing System for Performing the Same, and Lithography Method.” The invention describes forming a photoresist layer over wafer structures and a mark positioned between adjacent structures, then irradiating the mark with a beam to detect its coordinates. It determines an offset based on a factor that changes the beam path and corrects the coordinates accordingly. This approach addresses coordinate accuracy in lithography processes involving wafer structures with alternating mold insulating and sacrificial layers.

Career Highlights

Park’s listed patent reflects work at the intersection of semiconductor fabrication, coordinate measurement, and lithography. The method is designed to account for beam-path changes that may affect mark detection and coordinate accuracy.

Collaborations

Park’s listed coworkers include Won Hyeok Jo and Woo-Yong Jung. The patent is associated with Samsung Electronics Ltd.

Conclusion

Seung Hak Park’s patent focuses on improving mark-coordinate detection and correction for semiconductor lithography, contributing to precision in wafer manufacturing.