The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 2026

Filed:

Aug. 11, 2023
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Seung Hak Park, Suwon-si, KR;

Won Hyeok Jo, Suwon-si, KR;

Woo-Yong Jung, Suwon-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 (2006.01); G03F 7/00 (2006.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
G03F 9/7088 (2013.01); G03F 7/039 (2013.01); G03F 7/70625 (2013.01); G03F 7/70683 (2013.01); G03F 7/706849 (2023.05);
Abstract

A method of detecting coordinates of a mark is provided. The method includes: providing a plurality of structures and the mark on a wafer, each of the plurality of structures including a plurality of mold insulating layers and a plurality of mold sacrificial layers, which are alternately stacked, an end of each of the plurality of structures including a portion having a stair shape, and the mark being between adjacent structures among the plurality of structures; forming a photoresist layer on the plurality of structures and the mark, the photoresist layer including a portion concave toward the wafer between the adjacent structures; detecting the coordinates of the mark by irradiating a beam to the mark; determining an offset of the coordinates of the mark based on a beam path changing factor; and correcting the coordinates of the mark based on the offset.


Find Patent Forward Citations

Quick Actions:

Park, Seung. (2026). Method for detecting coordinate of mark, computing system for performing the same, and lithography method (U.S. Patent No. 12769220). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12769220

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