Yongin, South Korea

Seung-Bae Park

This inventor holds 3 USPTO granted patents and 2 published patent applications. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2009-2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seung-Bae Park. Retrieved from https://idiyas.com/inventor/seung-bae-park-trlwj065

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 3 

% Patents Active = 66.7

Average Co-Inventor Count = 3.6

ph-index = 1

Forward Citations = 3(Granted Patents)


Location History:

  • Seoul, KR (2009)
  • Yongin-si, KR (2011 - 2012)

Company Filing History:


Years Active: 2009-2012

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3 patents (USPTO):Explore Patents

Title: Seung-Bae Park: Innovator in Semiconductor Technology

Introduction

Seung-Bae Park is a prominent inventor based in Yongin, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on innovative isolation layer structures that enhance the performance of semiconductor devices.

Latest Patents

One of Seung-Bae Park's latest patents is titled "Isolation layer structure, method of forming the same and method of manufacturing a semiconductor device including the same." This patent describes an isolation layer structure that consists of first to fourth oxide layer patterns. The first and third oxide layer patterns are sequentially formed in a first trench defined by a first recessed top surface of a substrate and the sidewalls of gate structures on the substrate in a first region. The first trench has a first width, and the first and third oxide layer patterns are designed to have no voids therein. In contrast, the second and fourth oxide layer patterns are sequentially formed in a second trench defined by a second recessed top surface of the substrate and the sidewalls of gate structures on the substrate in a second region. The second trench has a second width larger than the first width, and the fourth oxide layer pattern contains a void.

Career Highlights

Seung-Bae Park is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of semiconductor technology. His innovative approaches have led to advancements that are crucial for the development of modern electronic devices.

Collaborations

Throughout his career, Seung-Bae Park has collaborated with notable colleagues, including Kyu-Tae Na and Ju-Wan Kim. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Seung-Bae Park's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the industry. His work continues to shape the future of electronic devices and semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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