Jena, Germany

Sergiy Yulin


 

Average Co-Inventor Count = 3.6

ph-index = 2

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2011-2022

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3 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Sergiy Yulin

Introduction

Sergiy Yulin is a notable inventor based in Jena, Germany. He has made significant contributions to the field of optics, particularly in the development of multilayer mirrors for reflecting Extreme Ultraviolet (EUV) radiation. With a total of 3 patents to his name, Yulin's work has advanced the technology used in various applications.

Latest Patents

Yulin's latest patents include a multilayer mirror designed for reflecting EUV radiation and a method for producing such mirrors. This multilayer mirror features a layer sequence composed of alternating first and second layers. The first layers consist of lanthanum or a lanthanum compound, while the second layers are made of boron and are doped with carbon, maintaining a molar fraction of carbon at 10% or less. Another significant patent is for a thermally stable multilayer mirror for the EUV spectral range. This invention includes a layer sequence arranged on a substrate, with each layer pair comprising a first layer made of a first material and a second layer made of a second material. The materials used include silicon boride or molybdenum nitride, with each layer having a thickness of more than 2 nm.

Career Highlights

Throughout his career, Sergiy Yulin has worked with prestigious organizations, including the Fraunhofer Society for the Advancement of Applied Research. His work at these institutions has allowed him to focus on innovative research and development in optics.

Collaborations

Yulin has collaborated with notable colleagues such as Nicolas Benoit and Torsten Feigl. These partnerships have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Sergiy Yulin's contributions to the field of optics, particularly through his innovative patents, have made a significant impact. His work continues to influence advancements in technology related to EUV radiation.

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