The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 15, 2022

Filed:

Sep. 25, 2017
Applicant:

Fraunhofer-gesellschaft Zur Förderung Der Angewandten Forschung E.v., Munich, DE;

Inventors:

Philipp Naujok, Jena, DE;

Sergiy Yulin, Jena, DE;

Norbert Kaiser, Jena, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/08 (2006.01); G21K 1/06 (2006.01); C23C 14/06 (2006.01); C23C 28/00 (2006.01); C23C 14/18 (2006.01); G02B 13/14 (2006.01); C23C 14/35 (2006.01); G03F 7/20 (2006.01); G01N 23/20008 (2018.01); B82Y 30/00 (2011.01);
U.S. Cl.
CPC ...
G02B 5/0891 (2013.01); C23C 14/0605 (2013.01); C23C 14/067 (2013.01); C23C 14/185 (2013.01); C23C 14/35 (2013.01); C23C 28/42 (2013.01); C23C 28/44 (2013.01); G02B 13/143 (2013.01); G03F 7/70958 (2013.01); G21K 1/062 (2013.01); B82Y 30/00 (2013.01); G01N 23/20008 (2013.01); G21K 2201/061 (2013.01);
Abstract

A multilayer mirror for reflecting Extreme Ultraviolet (EUV) radiation and a method for producing the same are disclosed. In an embodiment a multilayer mirror includes a layer sequence having a plurality of alternating first layers and second layers, the first layers including lanthanum or a lanthanum compound and the second layers including boron, wherein the second layers are doped with carbon, and wherein a molar fraction of carbon in the second layers is 10% or less.


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