Company Filing History:
Years Active: 2022
Title: The Innovative Contributions of Philipp Naujok
Introduction
Philipp Naujok is a notable inventor based in Jena, Germany. He has made significant contributions to the field of optics, particularly in the development of multilayer mirrors for reflecting Extreme Ultraviolet (EUV) radiation. His work is essential for advancements in various technological applications.
Latest Patents
Naujok holds a patent for a multilayer mirror designed for reflecting EUV radiation. The patent describes a multilayer mirror that includes a layer sequence with alternating first and second layers. The first layers consist of lanthanum or a lanthanum compound, while the second layers are made of boron and are doped with carbon, maintaining a molar fraction of carbon at 10% or less. This innovative design enhances the efficiency of EUV radiation reflection.
Career Highlights
Throughout his career, Philipp Naujok has worked with prestigious organizations, including the Fraunhofer Society for the Advancement of Applied Research. His experience in these institutions has allowed him to contribute to cutting-edge research and development in his field.
Collaborations
Naujok has collaborated with esteemed colleagues such as Sergiy Yulin and Norbert Kaiser. These partnerships have fostered a collaborative environment that promotes innovation and the sharing of ideas.
Conclusion
Philipp Naujok's contributions to the field of optics, particularly through his patent for a multilayer mirror, highlight his role as an influential inventor. His work continues to impact the advancement of technology in significant ways.