Fraunhofer-gesellschaft Zur Foerderung Der Angewandten Forschung E.v.

Sergiy Yulin

Norbert Kaiser

Torsten Feigl

Nicolas Benoit

Nobert Kaiser

Philipp Naujok

Kevin Murray

Viatcheslav Nesterenko

A multilayer mirror for reflecting Extreme Ultraviolet (EUV) radiation and a method for producing the same are disclosed. In an embodiment a multilayer mirror includes a layer sequence having a plurality of alternating first layers and second layers, the first layers including lanthanum or a lanthanum compound and the second layers including boron, wherein the second layers are doped with carbon, and wherein a molar fraction of carbon in the second layers is 10% or less.

Multilayer mirror for reflecting EUV radiation and method for producing the same

A multilayer mirror includes a layer sequence arranged on a substrate and a plurality of layer pairs. Each layer pair includes a first layer composed of a first material and a second layer composed of a second material. The first layers and the second layers each have a thickness of more than 2 nm, and the first material or the second material is a silicon boride or a molybdenum nitride.

Thermally stable multilayer mirror for the EUV spectral range

In a multilayer mirror () for the reflection of EUV radiation containing a large number of alternating molybdenum layers () and silicon layers (), a barrier layer () containing a silicon nitride or a silicon boride is included at a number of interfaces between the molybdenum layers () and the silicon layers (). As a result of the barrier layers () of a silicon nitride or of a silicon boride, high thermal stability is achieved, in particular high long-term stability at temperatures of more than 300&#xb0; C., whilst at the same time achieving high reflectivity in the multilayer mirror. A multilayer mirror () of this type can, in particular, be used as a heatable collector mirror for an EUV radiation source.

Thermally stable multilayer mirror for the EUV spectral region

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Jena, Germany

Sergiy Yulin