This inventor holds 2 USPTO granted patents. Top assignees: Ltcam Co., Ltd., Skhynix Inc.. Active years: 2020-2021.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:


Years Active: 2020-2021
Title: Seong Sik Jeon: Innovator in Silicon Nitride Etching Technologies
Introduction
Seong Sik Jeon is a prominent inventor based in Suwon, South Korea. He has made significant contributions to the field of semiconductor processing, particularly in the development of etching compositions for silicon nitride films. With a total of 2 patents, his work has advanced the efficiency and selectivity of etching processes in the semiconductor industry.
Latest Patents
One of his latest patents is an etching composition effective to selectively wet etch a silicon nitride film. This composition includes an inorganic acid, a silicon-based compound, and an ammonium-based compound composed of ammonium acetic acid, along with water. The etching method he developed allows for wet etching of silicon nitride films at an etching rate that is at least 200 times faster than that of a corresponding silicon oxide film.
Another notable patent is an etchant composition with high selectivity to silicon nitride. This composition is designed to etch away silicon nitride films in semiconductor processes while maintaining a high etching rate for silicon nitride compared to silicon oxide. The selectivity achieved is 2000:1 or higher, minimizing damage to the silicon oxide film and preventing re-growth during the etching process.
Career Highlights
Seong Sik Jeon has worked with several notable companies in the semiconductor industry, including Ltcam Co., Ltd. and SK Hynix Inc. His experience in these organizations has allowed him to refine his expertise in etching technologies and contribute to innovative solutions in semiconductor manufacturing.
Collaborations
Throughout his career, Seong Sik Jeon has collaborated with talented individuals such as Jung Hwan Song and Junwoo Lee. These collaborations have fostered a creative environment that has led to significant advancements in their respective fields.
Conclusion
Seong Sik Jeon is a key figure in the development of advanced etching technologies for silicon nitride films. His innovative patents and contributions to the semiconductor industry highlight his expertise and commitment to enhancing manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile