This inventor holds 4 USPTO granted patents and 1 published patent application. Top assignee: Samsung Electronics Ltd.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Seok Heo - Innovator in Spin Coating Technology
Introduction
Seok Heo is a notable inventor based in Suwon, South Korea. He has made significant contributions to the field of spin coating technology, particularly through his innovative patent. His work is recognized within the industry, especially at Samsung Electronics Ltd., where he applies his expertise.
Latest Patents
Seok Heo holds a patent for a spin coater, which includes several key components. The spin coater features a spin chuck designed to make contact with the central portion of a substrate's lower surface. It is capable of rotating the substrate when photoresist is applied. Additionally, the device includes a nozzle positioned over the spin chuck to deliver photoresist to the substrate's upper surface. The invention also incorporates two temperature controllers, each responsible for regulating temperatures in different regions of the spin chuck. This innovative design enhances the efficiency and effectiveness of the spin coating process.
Career Highlights
Throughout his career, Seok Heo has demonstrated a commitment to advancing technology in his field. His work at Samsung Electronics Ltd. has allowed him to collaborate with other talented professionals and contribute to groundbreaking projects. His patent reflects his dedication to improving manufacturing processes and product quality.
Collaborations
Seok Heo has worked alongside esteemed colleagues such as Sunghwan Kim and Seungjoon Song. Their collaborative efforts have fostered an environment of innovation and creativity, leading to advancements in spin coating technology.
Conclusion
Seok Heo's contributions to spin coating technology through his patent exemplify his innovative spirit and dedication to his field. His work continues to influence the industry and inspire future advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile