The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2026
Filed:
Jun. 15, 2023
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, KR;
Inventors:
Youngho Hwang, Suwon-si, KR;
Sanghyun Lim, Suwon-si, KR;
Jaehong Lim, Suwon-si, KR;
Seok Heo, Suwon-si, KR;
Assignee:
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10P 76/20 (2026.01); H10P 72/00 (2026.01); H10P 95/90 (2026.01);
U.S. Cl.
CPC ...
H10P 76/2041 (2026.01); H10P 72/0432 (2026.01); H10P 72/0602 (2026.01); H10P 95/904 (2026.01);
Abstract
A manufacturing method of a semiconductor element includes: providing a photoresist on a wafer; supplying a first gas, containing oxygen, at a first flow rate to a bake chamber such that oxygen solubility of the photoresist becomes saturated, and supplying a second gas, which is oxygen-free, at a second flow rate to the bake chamber; and performing a bake process on the wafer in the bake chamber.
Quick Actions:
Hwang, Youngho. (2026). Manufacturing method of semiconductor element by using extreme ultra violet (U.S. Patent No. 12772808). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12772808
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile