Seohee Park

Title: Seohee Park: Innovator in Semiconductor Technology

Introduction

Seohee Park is a prominent inventor based in Daejeon, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on advancing semiconductor devices, which are crucial for modern electronics.

Latest Patents

Seohee Park's latest patents include innovative designs for semiconductor devices. The first patent describes a semiconductor device that features a channel layer made of a single-layer oxide semiconductor material. This channel layer incorporates indium (In), gallium (Ga), and oxygen (O), and is structured with three distinct regions. The second patent outlines a semiconductor device that consists of a substrate, a conductive line, and a crystalline oxide semiconductor layer. This design enhances the functionality and efficiency of semiconductor devices.

Career Highlights

Seohee Park is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to be at the forefront of semiconductor innovation, contributing to the development of cutting-edge technologies.

Collaborations

Seohee Park has collaborated with notable colleagues, including Teawon Kim and Yurim Kim. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Seohee Park is a key figure in the semiconductor industry, with a focus on developing advanced technologies that drive the future of electronics. His contributions through patents and collaborations highlight his commitment to innovation in this vital field.