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For the Inventor, By the Inventor

Utsunomiya, Japan

Seima Kato

USPTO Granted Patents = 15 

 

Average Co-Inventor Count = 1.2

ph-index = 2

Forward Citations = 25(Granted Patents)


Company Filing History:

goldMedal15 out of 90,697 
 
Canon Kabushiki Kaisha
 patents

Years Active: 2007-2025

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15 patents (USPTO):Explore Patents
1. 12385804 - Optical apparatus, evaluation apparatus, evaluation method, and manufacturing method of optical system (2025-08-12),
2. 9557241 - Wavefront aberration measuring method, wavefront aberration measuring apparatus and optical element manufacturing method (2017-01-31),
3. 8786863 - Transmitted wavefront measuring method, refractive-index distribution measuring method, and transmitted wavefront measuring apparatus that calculate a frequency distribution and obtain a transmitted wavefront of the object based on a primary frequency spectrum in the frequency distribution (2014-07-22),
4. 8525982 - Refractive index distribution measuring method and refractive index distribution measuring apparatus (2013-09-03),
5. 8520217 - Talbot interferometer, its adjustment method, and measurement method (2013-08-27),
6. 8508725 - Refractive index distribution measuring method and apparatus using position measurement and a reference object (2013-08-13),
7. 8477297 - Refractive index distribution measuring method and apparatus, and method of producing optical element thereof, that use multiple transmission wavefronts of a test object immersed in at least one medium having a different refractive index from that of the test object and multiple reference transmission wavefronts of a reference object having known shape and refractive index distribution (2013-07-02),
8. 8472013 - Refractive index distribution measurement method and apparatus that measure transmission wavefronts of a test object immersed in different media having refractive index lower than that of the test object (2013-06-25),
9. 8077391 - Wavefront aberration measuring method, mask, wavefront aberration measuring device, exposure apparatus, and device manufacturing method (2011-12-13),
10. 8004691 - Measuring apparatus, exposure apparatus and method, and device manufacturing method (2011-08-23),
11. 7952726 - Measurement apparatus, exposure apparatus having the same, and device manufacturing method (2011-05-31),
12. 7692799 - Measurement apparatus, exposure apparatus, and device fabrication method (2010-04-06),
13. 7474413 - Method and apparatus for analyzing interference fringe (2009-01-06),
14. 7443515 - Apparatus for measuring optical properties of tested optical system using interference (2008-10-28),
15. 7283252 - Measuring method and apparatus using interference, exposure method and apparatus using the same, and device fabrication method (2007-10-16),

Title: Seima Kato: Innovator in Wavefront Aberration Measurement

Introduction

Seima Kato, an accomplished inventor from Utsunomiya, Japan, has made significant contributions to the field of optical measurements with a total of 14 patents to his name. His work primarily focuses on advanced methods for measuring wavefront aberrations and enhancing optical element manufacturing processes.

Latest Patents

Among his latest innovations are two notable patents: a wavefront aberration measuring method and apparatus, along with a method for manufacturing optical elements. The wavefront aberration measuring method involves measuring the intensity distribution of light transmitted through or reflected by an object. Using a light-receiving sensor, Kato calculates a first differential wavefront and subsequently performs a correction based on the incident angle of the measuring light. This process ultimately allows for the evaluation of wavefront aberration by utilizing the corrected second differential wavefront.

Additionally, his transmitted wavefront measuring method employs a light source to illuminate an object, capturing the resulting interference light transmitted through it. By analyzing this light via a diffraction grating and performing a Fourier transform, he establishes a frequency distribution and a transmitted wavefront. Kato’s methodologies promise significant advancements in optical technologies.

Career Highlights

Seima Kato is affiliated with Canon Kabushiki Kaisha, a leading company renowned for its innovations in imaging and optical products. His dedication to research and development within this organization has propelled him to the forefront of optical measurement technology.

Collaborations

During his career, Kato has collaborated with notable colleagues, including Chidane Ouchi and Toshiyuki Naoi. Working alongside such talented individuals has likely fostered a vibrant exchange of ideas and spurred further advancements in their shared field.

Conclusion

In conclusion, Seima Kato's innovative approaches in the realm of wavefront measurement not only highlight his expertise as an inventor but also underscore the potential for his technologies to impact various applications in optics. As his work continues to evolve, Kato remains a prominent figure in the advancement of optical measurement methodologies, paving the way for future innovations.

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