The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 2017
Filed:
Mar. 25, 2014
Canon Kabushiki Kaisha, Tokyo, JP;
Seima Kato, Utsunomiya, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
The wavefront aberration measuring method includes measuring an intensity distribution of a measuring light transmitted through or reflected by an object to be measured, by using a light-receiving sensor, calculating a first differential wavefront which is a differential wavefront of the measuring light on the light-receiving sensor, and calculating a second differential wavefront by performing a correction process on the first differential wavefront depending on an incident angle of the measuring light to the light-receiving sensor. The method further includes calculating a wavefront aberration of the object by using the second differential wavefront.