Fremont, CA, United States of America

Sean X Wu

USPTO Granted Patents = 4 

Average Co-Inventor Count = 2.4

ph-index = 2

Forward Citations = 21(Granted Patents)


Company Filing History:


Years Active: 2008-2019

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4 patents (USPTO):Explore Patents

Title: Innovations of Sean X Wu

Introduction

Sean X Wu is a notable inventor based in Fremont, California, recognized for his contributions to the field of automated inspection technologies. With a total of four patents to his name, Wu has made significant advancements in the inspection of manufactured substrates.

Latest Patents

One of Wu's latest patents is titled "Method and apparatus for inspection of scattered hot spot areas on a manufactured substrate." This invention involves a method of automated inspection using an electron beam apparatus. The process includes moving a stage that holds the substrate along a swath path, allowing the electron beam's field of view to cover a target area on the substrate. Off-axis imaging is performed to identify hot spot areas within this moving field of view. The system can determine the number of hot spot areas and adjust the speed of the stage movement accordingly. Another embodiment of this patent relates to the electron beam apparatus itself, designed for inspecting scattered areas on manufactured substrates.

Career Highlights

Throughout his career, Sean X Wu has worked with prominent companies in the technology sector, including KLA-Tencor Technologies Corporation and KLA Tencor Corporation. His experience in these organizations has contributed to his expertise in the field of inspection technologies.

Collaborations

Wu has collaborated with notable colleagues, including Haiguang Chen and Michael D. Kirk, further enhancing his work in the industry.

Conclusion

Sean X Wu's innovative contributions to automated inspection technologies demonstrate his commitment to advancing the field. His patents reflect a deep understanding of the challenges in manufacturing processes and offer solutions that enhance efficiency and accuracy.

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