Scott H Prengle

Title: Scott H. Prengle: Innovator in Semiconductor Technology

Introduction

Scott H. Prengle is a notable inventor based in Plano, TX, who has made significant contributions to the field of semiconductor technology. He holds a total of 6 patents, showcasing his innovative approach to complex engineering challenges. His work primarily focuses on enhancing the performance and efficiency of integrated circuits.

Latest Patents

Among his latest patents is a groundbreaking etch process for gate stacks. This five-step, low-pressure, high-density-plasma etch process is designed to etch complicated DRAM transistor gate stacks with high inter-layer selectivity. The layers involved in this process include silicon nitride, tungsten, titanium nitride, and polysilicon. The innovative method allows for the fabrication of gates with lengths of 0.25 microns and below, achieving excellent profile and linewidth uniformity across the wafer while minimizing gate oxide loss.

Another significant patent involves an integrated circuit structure featuring a bipolar transistor with a thick base oxide and a field-effect transistor with a thin gate oxide. This BiCMOS structure utilizes a deposited dielectric layer between the emitter electrode and the base region. The process includes the deposition of polysilicon, base implant, and the formation of TEOS oxide, culminating in a sophisticated structure that enhances transistor performance.

Career Highlights

Scott H. Prengle is currently employed at Texas Instruments Corporation, where he continues to push the boundaries of semiconductor innovation. His expertise and dedication to research have positioned him as a key player in the development of advanced electronic components.

Collaborations

Throughout his career, Scott has collaborated with esteemed colleagues such as Robert H. Eklund and James Carl Baker. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the advancement of technology.

Conclusion

Scott H. Prengle's contributions to semiconductor technology through his innovative patents and collaborative efforts highlight his importance in the field. His work continues to influence the development of advanced electronic systems, making a lasting impact on the industry.