Scott Gregory Bushman

Title: Scott Gregory Bushman: Innovator in Semiconductor Technology

Introduction

Scott Gregory Bushman is a notable inventor based in Richardson, TX (US). He has made significant contributions to the field of semiconductor technology, holding a total of 8 patents. His innovative work focuses on enhancing the fabrication processes of semiconductor devices, particularly those involving silicon germanium (SiGe) materials.

Latest Patents

One of his latest patents is titled "Methodology of implementing ultra high temperature (UHT) anneal in fabricating devices that contain SiGe." This patent describes methods for implementing an ultra-high temperature anneal on SiGe semiconductor materials by co-implanting carbon into the SiGe material prior to the anneal. The carbon implantation increases the melting point of the SiGe material, allowing for a higher temperature during the anneal process. This innovation helps reduce wafer warpage and potential lithographic misalignment during subsequent processes. Another significant patent is the "Run-to-run control method for automated control of metal deposition processes." This method involves monitoring the consumption of a sputter target to determine the deposition rate of a metal layer during processing. It models the dependence of the deposition rate on various factors and applies this model to achieve a desired thickness for the metal layer.

Career Highlights

Throughout his career, Scott has worked with prominent companies such as Advanced Micro Devices Corporation and Texas Instruments Corporation. His experience in these organizations has allowed him to develop and refine his innovative techniques in semiconductor fabrication.

Collaborations

Scott has collaborated with notable colleagues, including Thomas J Sonderman and William Jarrett Campbell. These partnerships have contributed to the advancement of his research and the successful implementation of his patented technologies.

Conclusion

Scott Gregory Bushman is a distinguished inventor whose work in semiconductor technology has led to significant advancements in the field. His innovative patents and collaborations reflect his commitment to improving fabrication processes and enhancing device performance.