Scott Chang

Title: Scott Chang: Innovator in Polishing Technology

Introduction

Scott Chang is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of polishing technology, holding a total of 3 patents. His work focuses on improving the quality and efficiency of polishing processes in various materials.

Latest Patents

Among his latest patents is the "Polishing Layer Analyzer and Method." This invention provides an analyzer designed to detect macro inhomogeneities in polymeric sheets, classifying them as either acceptable or suspect. Another significant patent is the "Method of Manufacturing Chemical Mechanical Polishing Pads." This method involves an automated inspection system that detects macro inhomogeneities in skived sheets, classifying them similarly, and further processing acceptable sheets to create polishing layers for chemical mechanical polishing pads.

Career Highlights

Scott has worked with prominent companies in the industry, including Rohm and Haas Electronic Materials CMP Holdings, Inc. and Dow Global Technologies LLC. His experience in these organizations has allowed him to refine his expertise in polishing technologies and contribute to innovative solutions in the field.

Collaborations

Throughout his career, Scott has collaborated with talented individuals such as Francis V Acholla and Andrew Wank. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Scott Chang's contributions to polishing technology through his patents and collaborations highlight his role as an influential inventor in the industry. His work continues to impact the field positively, paving the way for future innovations.