This inventor holds 3 USPTO granted patents. Top assignee: Applied Materials, Inc.. Active years: 2007-2008.
Company Filing History:
Years Active: 2007-2008
Title: Scott C. Stovall: Innovator in Particle Beam Lithography
Introduction
Scott C. Stovall is a prominent inventor based in San Jose, CA (US). He has made significant contributions to the field of particle beam lithography, holding a total of 3 patents. His innovative work focuses on improving the precision and efficiency of beam exposure systems.
Latest Patents
Stovall's latest patents include a "Beam Exposure Correction System and Method" and a "Beam Blanker Driver System and Method." The beam exposure correction system involves determining shape and position corrections of a beam used in particle beam lithography. This method includes calculating corrected deflector voltage values to enhance the accuracy of the beam's positioning. The beam blanker driver system focuses on blanking a particle beam, utilizing a frequency divider and a logic circuit to create blanking signals that improve the overall functionality of the lithography system.
Career Highlights
Scott C. Stovall is currently employed at Applied Materials, Inc., where he continues to develop cutting-edge technologies in the field of semiconductor manufacturing. His work has been instrumental in advancing the capabilities of particle beam lithography systems.
Collaborations
Stovall collaborates with talented individuals such as Jimmy Iskandar and Benyamin Buller, contributing to a dynamic team focused on innovation and excellence in their field.
Conclusion
Scott C. Stovall is a key figure in the advancement of particle beam lithography, with a strong portfolio of patents that reflect his expertise and dedication to innovation. His contributions continue to shape the future of semiconductor technology.