The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 04, 2007
Filed:
Sep. 28, 2005
Curt Blanding, San Jose, CA (US);
Scott C. Stovall, San Jose, CA (US);
Curt Blanding, San Jose, CA (US);
Scott C. Stovall, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A particle beam lithography system and method of blanking a beam such as a particle or other beam. The system may include a frequency divider adapted to convert a master clock signal at a first frequency into an integral number N of waveforms at a second frequency, a reference device adapted to provide a fixed threshold reference signal, a sequencer adapted to provide N sets of data, a blanking circuit for each of the waveforms for creating a blanking signal for each of the waveforms, and a logic circuit for combining each of the blanking signals from each of the blanking circuits. The blanking circuit may include a digital to analog converter adapted to receive one of the N sets of data from the sequencer and to generate a variable threshold reference signal and a window comparator adapted to receive one of the waveforms, the fixed threshold reference signal, and the variable threshold reference signal and to generate a blanking signal.