San Jose, CA, United States of America

Curt Blanding

This inventor holds 2 USPTO granted patents. Top assignees: Applied Materials, Inc., Quickturn Design Systems, Inc.. Active years: 1999-2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Curt Blanding. Retrieved from https://idiyas.com/inventor/curt-blanding

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0

Average Co-Inventor Count = 2.9

ph-index = 1

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 1999-2007

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2 patents (USPTO):Explore Patents

Title: Curt Blanding: Innovator in Particle Beam Lithography and Circuit Emulation

Introduction

Curt Blanding is a notable inventor based in San Jose, CA, who has made significant contributions to the fields of particle beam lithography and circuit emulation. With a total of 2 patents, Blanding's work showcases his expertise and innovative spirit in developing advanced technologies.

Latest Patents

Blanding's latest patents include the "Beam blanker driver system and method" and "Software reconfigurable target I/O in a circuit emulation system." The beam blanker driver system focuses on a particle beam lithography system that effectively manages the blanking of beams. This system incorporates a frequency divider, a reference device, a sequencer, and a logic circuit to create precise blanking signals. The second patent, related to circuit emulation, describes a time-sliced hardware-based emulator that allows for programmable I/O assignments, DC voltage levels, and various sample modes. This emulator connects to a target system through a specialized interface, enabling efficient data transfer.

Career Highlights

Throughout his career, Curt Blanding has worked with prominent companies such as Quickturn Design Systems, Inc. and Applied Materials, Inc. His experience in these organizations has contributed to his development of innovative solutions in technology.

Collaborations

Blanding has collaborated with notable professionals in the industry, including Tony R. Sarno and Ingo Schaefer. These collaborations have further enriched his work and expanded his impact in the field.

Conclusion

Curt Blanding's contributions to particle beam lithography and circuit emulation highlight his innovative capabilities and dedication to advancing technology. His patents reflect a commitment to developing systems that enhance efficiency and precision in complex processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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