The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 2008
Filed:
Sep. 28, 2005
Scott C. Stovall, San Jose, CA (US);
Benyamin Buller, Cupertino, CA (US);
Jimmy Iskandar, Fremont, CA (US);
Ming Lun Yu, Fremont, CA (US);
Scott C. Stovall, San Jose, CA (US);
Benyamin Buller, Cupertino, CA (US);
Jimmy Iskandar, Fremont, CA (US);
Ming Lun Yu, Fremont, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A system and method of determining shape and position corrections of a beam such as a particle or other beam used in a system such as a particle beam lithography. The method of providing corrected deflector voltages may include determining a voltage step value by subtracting a previous deflector voltage value with a current deflector voltage value; determining a plurality of correction values using the voltage step value and an exposure time for the current deflector voltage value; selecting a current voltage correction value from the plurality of correction values using the current deflector voltage value; and calculating a corrected deflector voltage value by adding the current voltage correction value to the current deflector voltage value.