Tempe, AZ, United States of America

Saul Alvarado

This inventor holds 3 USPTO granted patents. Top assignee: Fujifilm Electronic Materials U.s.a., Inc.. Active years: 2021-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Saul Alvarado. Retrieved from https://idiyas.com/inventor/saul-alvarado

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2021-2024

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3 patents (USPTO):Explore Patents

Title: The Innovations of Saul Alvarado

Introduction

Saul Alvarado is an accomplished inventor based in Tempe, AZ (US). He has made significant contributions to the field of chemical mechanical polishing, holding a total of 3 patents. His work focuses on developing polishing compositions that enhance the efficiency and effectiveness of various materials.

Latest Patents

Alvarado's latest patents include innovative polishing compositions designed for reduced defectivity. These chemical mechanical polishing compositions consist of an abrasive, an additive, and water. Notably, the polishing compositions have a value of less than 800,000 for the relation of large particle counts to weight percent abrasive, measured using a 0.2 μm bin size. This advancement is crucial for improving the quality of polished surfaces in various applications.

Career Highlights

Saul Alvarado is currently employed at Fujifilm Electronic Materials U.S.A., Inc., where he continues to push the boundaries of innovation in his field. His expertise in chemical mechanical polishing has positioned him as a key player in the development of advanced materials.

Collaborations

Alvarado collaborates with talented professionals, including his coworker James McDonough. Together, they work on projects that aim to enhance the performance and reliability of polishing compositions.

Conclusion

Saul Alvarado's contributions to the field of chemical mechanical polishing are noteworthy. His innovative patents and ongoing work at Fujifilm Electronic Materials U.S.A., Inc. demonstrate his commitment to advancing technology in this area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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