Tokyo, Japan

Satoyuki Nomura

USPTO Granted Patents = 2 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2024

where 'Filed Patents' based on already Granted Patents

2 patents (USPTO):

Title: The Innovative Contributions of Satoyuki Nomura

Introduction

Satoyuki Nomura is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of materials science, particularly in the development of advanced slurry and polishing methods. With a total of two patents to his name, Nomura's work is recognized for its innovative approach to enhancing surface finishing processes.

Latest Patents

Nomura's latest patents include a slurry and polishing method that utilizes a unique composition of abrasive grains and a liquid medium. The first patent describes a slurry containing abrasive grains, where the grains include first and second particles. The second particles consist of at least one metal compound, such as a metal oxide or metal hydroxide, which is capable of taking multiple valences. This innovative slurry achieves a specific ratio of the lowest valence in X-ray photoelectron spectroscopy, enhancing its effectiveness in polishing applications. His second patent further refines this concept, detailing a slurry that, when applied to a surface, yields a specific ratio in X-ray photoelectron spectroscopy, ensuring optimal polishing results.

Career Highlights

Satoyuki Nomura is currently employed at Resonac Corporation, where he continues to push the boundaries of innovation in his field. His work has not only contributed to the company's success but has also advanced the industry standards for polishing methods.

Collaborations

Nomura collaborates with talented colleagues, including Tomohiro Iwano and Takaaki Matsumoto. Their combined expertise fosters a creative environment that drives innovation and leads to groundbreaking developments in their projects.

Conclusion

Satoyuki Nomura's contributions to the field of materials science through his innovative patents demonstrate his commitment to advancing technology. His work at Resonac Corporation and collaborations with esteemed colleagues highlight the importance of teamwork in achieving significant breakthroughs.

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