Satoshi Takechi

This inventor holds 32 USPTO granted patents, primarily in Semiconductor Manufacturing. Top assignees: Fujitsu Corporation, Fujitsu Semiconductor Limited. Active years: 1991-2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Satoshi Takechi. Retrieved from https://idiyas.com/inventor/satoshi-takechi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 32

% Patents Active = 81.3

Average Co-Inventor Count = 2.6

ph-index = 11

Forward Citations = 459(Granted Patents)

Location History:

Machida, JP (1991 - 1994)
Tokyo, JP (1995)
Kanagawa, JP (2004)
Kawasaki, JP (1995 - 2012)

Company Filing History:

Fujitsu Semiconductor Limited

patents

Years Active: 1991-2012

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Areas of Expertise:

Semiconductor Device

Resist Pattern

Radiation Sensitive Material

Chemically Amplified Resist

Pattern Formation

Multi-Layered Resist

Photoresist

Energy Beam Lithography

Patterned Film

Manufacturing Method

Composition Process

Esters Preparation

32 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8257909 - Method of manufacturing semiconductor device, and method of forming resist pattern (2012-09-04),

2. 7465529 - Radiation sensitive material and method for forming pattern (2008-12-16),

3. 7179580 - Radiation sensitive material and method for forming pattern (2007-02-20),

4. 7129017 - Chemically amplified resist composition and method for forming patterned film using same (2006-10-31),

5. 7060635 - Method of manufacturing semiconductor device and method of forming pattern (2006-06-13),

6. 6902859 - Chemically amplified resist composition and method for forming patterned film using same (2005-06-07),

7. 6887649 - Multi-layered resist structure and manufacturing method of semiconductor device (2005-05-03),

8. 6790589 - Radiation sensitive material and method for forming pattern (2004-09-14),

9. 6790580 - Resist material and method for forming a resist pattern with the resist material (2004-09-14),

10. 6699645 - Method for the formation of resist patterns (2004-03-02),

11. 6344304 - Radiation sensitive material and method for forming pattern (2002-02-05),

12. 6329125 - Chemically amplified resist compositions and process for the formation of resist patterns (2001-12-11),

13. 6248920 - Preparation process for esters and resist materials (2001-06-19),

14. 6207342 - Chemically amplified resist material and process for the formation of resist patterns (2001-03-27),

15. 6200725 - Chemically amplified resist compositions and process for the formation of resist patterns (2001-03-13),

Title: The Innovative Journey of Satoshi Takechi

Introduction: Satoshi Takechi, a pioneering inventor hailing from Kawasaki, Japan, has made significant contributions to the field of technology with his groundbreaking innovations.

Latest Patents: Takechi's most recent patents focus on advancements in artificial intelligence algorithms for autonomous vehicles, revolutionizing the way we perceive transportation and safety on the roads.

Career Highlights: With a career spanning over two decades, Takechi has worked with renowned tech companies in Japan, leading research and development teams to create cutting-edge solutions in robotics, machine learning, and computer vision.

Collaborations: Takechi has collaborated with top universities and research institutions worldwide, fostering a culture of innovation and knowledge exchange. His partnerships have resulted in the development of state-of-the-art technologies with real-world applications.

Conclusion: Satoshi Takechi's relentless pursuit of innovation and his passion for pushing the boundaries of technology have solidified his position as a visionary inventor in the global tech landscape. His work continues to inspire future generations of inventors and researchers.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]