The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 13, 2001
Filed:
Nov. 28, 1997
Satoshi Takechi, Kawasaki, JP;
Akiko Kotachi, Kawasaki, JP;
Koji Nozaki, Kawasaki, JP;
Ei Yano, Kawasaki, JP;
Keiji Watanabe, Kawasaki, JP;
Takahisa Namiki, Kawasaki, JP;
Miwa Igarashi, Kawasaki, JP;
Yoko Makino, Kawasaki, JP;
Makoto Takahashi, Kawasaki, JP;
Fujitsu Limited, Kawasaki, JP;
Abstract
Alkali-developable, chemically amplified resist composition which comprises an alkali-insoluble compound having a structural unit containing a protected alkali-soluble group in which unit a protective moiety of said protected alkali-soluble group contains an alicyclic hydrocarbon group having bonded to a carbon atom thereof a —CH,—R,′ group wherein R,′ is methyl, ethyl, propyl or isopropyl, and said alkali-soluble group is cleaved upon action of an acid generated from a photoacid generator used in combination with said compound, thereby releasing said protective moiety from the alkali-soluble group and converting said compound to an alkali-soluble one, and a photoacid generator capable of being decomposed upon exposure to a patterning radiation to thereby produce an acid capable of causing cleavage of said protective moiety. The resist composition can exhibit a high sensitivity (not more than 5 mJ/cm,) and therefore is particularly suitable for ArF lithography and also can exhibit stable patterning properties.