Location History:
- Yokohama, JP (1991 - 1995)
- Kawasaki, JP (1999 - 2001)
Company Filing History:
Years Active: 1991-2001
Title: Akiko Kotachi: Innovator in Chemically Amplified Resist Compositions
Introduction
Akiko Kotachi is a prominent inventor based in Yokohama, Japan. She has made significant contributions to the field of chemically amplified resist compositions, holding a total of 11 patents. Her work is particularly relevant in the context of advanced lithography techniques.
Latest Patents
Among her latest patents is a chemically amplified resist composition that is alkali-developable. This composition includes an alkali-insoluble compound with a structural unit containing a protected alkali-soluble group. The protective moiety of this group features an alicyclic hydrocarbon group, which is bonded to a carbon atom with a —CH—R′ group, where R′ can be methyl, ethyl, propyl, or isopropyl. The alkali-soluble group is cleaved by an acid generated from a photoacid generator, which is used in combination with the compound. This process releases the protective moiety from the alkali-soluble group, converting the compound into an alkali-soluble one. The photoacid generator is capable of decomposing upon exposure to patterning radiation, producing an acid that facilitates the cleavage of the protective moiety. This resist composition demonstrates high sensitivity, not exceeding 5 mJ/cm², making it particularly suitable for ArF lithography while also exhibiting stable patterning properties.
Career Highlights
Akiko Kotachi is currently employed at Fujitsu Corporation, where she continues to innovate in her field. Her expertise in chemically amplified resist compositions has positioned her as a key figure in the development of advanced lithography materials.
Collaborations
She has collaborated with notable coworkers, including Satoshi Takechi and Koji Nozaki, contributing to the advancement of their shared research goals.
Conclusion
Akiko Kotachi's work in chemically amplified resist compositions has made a significant impact on the field of lithography. Her innovative patents and collaborations highlight her role as a leading inventor in this specialized area.
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