Company Filing History:
Years Active: 2001
Title: Yoko Makino: Innovator in Chemically Amplified Resist Compositions
Introduction
Yoko Makino is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of chemically amplified resist compositions, particularly in the context of lithography. With a total of two patents to his name, Makino's work is recognized for its innovative approach and technical precision.
Latest Patents
Makino's latest patents focus on alkali-developable, chemically amplified resist compositions. These compositions include an alkali-insoluble compound that features a structural unit containing a protected alkali-soluble group. The protective moiety of this group contains an alicyclic hydrocarbon group, which is bonded to a carbon atom with a —CH—R′ group, where R′ can be methyl, ethyl, propyl, or isopropyl. The alkali-soluble group is cleaved by an acid generated from a photoacid generator, which is used in combination with the compound. This process releases the protective moiety from the alkali-soluble group, converting the compound into an alkali-soluble one. The resist composition exhibits high sensitivity, not exceeding 5 mJ/cm², making it particularly suitable for ArF lithography while also demonstrating stable patterning properties.
Career Highlights
Yoko Makino is currently employed at Fujitsu Corporation, where he continues to advance his research and development in the field of resist compositions. His work has been instrumental in enhancing the capabilities of lithographic processes, which are critical in semiconductor manufacturing.
Collaborations
Makino has collaborated with notable colleagues, including Satoshi Takechi and Akiko Kotachi, who contribute to the innovative environment at Fujitsu Corporation. Their combined expertise fosters a collaborative atmosphere that drives forward-thinking solutions in technology.
Conclusion
Yoko Makino's contributions to chemically amplified resist compositions highlight his role as a key innovator in the field. His patents reflect a deep understanding of the complexities involved in lithography, and his work continues to influence advancements in semiconductor technology.
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