Fujitsu Corporation

Yoko Makino

Keiji Watanabe

Ei Yano

Koji Nozaki

Takahisa Namiki

Satoshi Takechi

Makoto Takahashi

Miwa Igarashi

Akiko Kotachi

Alkali-developable, chemically amplified resist composition which comprises an alkali-insoluble compound having a structural unit containing a protected alkali-soluble group in which unit a protective moiety of said protected alkali-soluble group contains an alicyclic hydrocarbon group having bonded to a carbon atom thereof a &mdash;CH,&mdash;R,&prime; group wherein R,&prime; is methyl, ethyl, propyl or isopropyl, and said alkali-soluble group is cleaved upon action of an acid generated from a photoacid generator used in combination with said compound, thereby releasing said protective moiety from the alkali-soluble group and converting said compound to an alkali-soluble one, and a photoacid generator capable of being decomposed upon exposure to a patterning radiation to thereby produce an acid capable of causing cleavage of said protective moiety. The resist composition can exhibit a high sensitivity (not more than 5 mJ/cm,) and therefore is particularly suitable for ArF lithography and also can exhibit stable patterning properties.

Chemically amplified resist compositions and process for the formation of resist patterns

Growing community of inventors

Kawasaki, Japan

Yoko Makino